Formation of nanostructured iridium and polycluster diamond film

  • A. F. Belyanin Central Research Technological Institute “Technomash-VOS”, Moscow, Russia
  • A. F. Pal' Skobeltsyn Institute of Nuclear Physics, Moscow, Russia
  • M. I. Samoylovich Central Research Technological Institute “Technomash-VOS”, Moscow, Russia
  • N. V. Suetin Skobeltsyn Institute of Nuclear Physics, Moscow, Russia
  • N. N. Dzbanovskiy Bochvar Institute of Inorganic Materials (VNIINM), Moscow, Russia
  • V. S. Mitin Central Research Technological Institute “Technomash-VOS”, Moscow, Russia
  • P. V. Pashchenko Central Research Technological Institute “Technomash-VOS”, Moscow, Russia
  • M. A. Timofeev Skobeltsyn Institute of Nuclear Physics, Moscow, Russia
Keywords: nanostructured iridium and diamond films, magnetron sputtering, microwave discharge, microelectronics

Abstract

Iridium films and layered “iridium–diamond” structures were formed on Al₂O₃, MgO, and SrTiO₃ substrates. Iridium films were deposited by magnetron sputtering, while polycluster diamond films were obtained using the microwave discharge method. The structure of iridium and diamond films was studied as a function of deposition conditions. The potential applications of polycluster diamond films as heat sinks for hybrid integrated circuits and as control grids in electronic devices are discussed.

Published
2007-12-30
How to Cite
Belyanin, A. F., Pal’, A. F., Samoylovich, M. I., Suetin, N. V., Dzbanovskiy, N. N., Mitin, V. S., Pashchenko, P. V., & Timofeev, M. A. (2007). Formation of nanostructured iridium and polycluster diamond film. Technology and Design in Electronic Equipment, (6), 50-56. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.6.50
Issue
No. 6 (2007): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2007 Belyanin A. F., Pal' A. F., Samoylovich M. I., Suetin N. V., Dzbanovskiy N. N., Mitin V. S., Pashchenko P. V., Timofeev M. A.

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