Modernization of the "Onyx" photonic annealing system for semiconductor wafers

  • H. V. Savytskyi SPA «Karat», Lviv, Ukraine
  • A. Yu. Bonchyk Ya. S. Pidstrygach Institute of Problems of Microelectronics and Design of NASU, Lviv, Ukraine
  • I. I. Izhnin SPA «Karat», Lviv, Ukraine
  • S. H. Kyyak Ya. S. Pidstrygach Institute of Problems of Microelectronics and Design of NASU, Lviv, Ukraine
  • I. A. Mohyliak Ya. S. Pidstrygach Institute of Problems of Microelectronics and Design of NASU, Lviv, Ukraine
  • I. P. Trostinskyi SPA «Karat», Lviv, Ukraine
Keywords: photonic annealing, semiconductor wafers, system modernization, temperature-time cycles, control program

Abstract

The modernization of the "Onyx" industrial photonic annealing system for semiconductor wafers was carried out to ensure the repeatability and reproducibility of short-duration annealing temperature-time cycles at high heating rates. The control program allows forming the temperature-time diagram of the wafer annealing process according to a preset one with a time setting accuracy of ~0.01 seconds and visual monitoring.

Published
2002-12-30
How to Cite
Savytskyi, H. V., Bonchyk, A. Y., Izhnin, I. I., Kyyak, S. H., Mohyliak, I. A., & Trostinskyi, I. P. (2002). Modernization of the "Onyx" photonic annealing system for semiconductor wafers. Technology and Design in Electronic Equipment, (6), 45-47. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2002.6.45
Issue
No. 6 (2002): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2002 Savytskii G. V., Bonchyk A. Yu., Izhnin I. I., Kyjak S. G., Mogyljak I. A., Trostynskii I.A.

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This work is licensed under a Creative Commons Attribution 4.0 International License.