Photometric control system for the etching rate of thin dielectric films

  • S. E. Semyonova Rybinsk State Aviation Technological Academy named after P. A. Solovyov, Russia
  • E. I. Semyonov Rybinsk State Aviation Technological Academy named after P. A. Solovyov, Russia
Keywords: automation, photometric control, etching rate, dielectric films, thin films

Abstract

A methodology for photometric control of the etching rate of thin dielectric films is proposed, the essence of which consists in applying methods of double differentiation and time intervals to the signal of a photometric measuring device. An automated photometric system implementing this methodology is described. A program has been developed for processing the obtained signal and calculating the current etching rate. Graphs of the photometric signal, film thickness, and instantaneous deposition or etching rate of the dielectric film are displayed on the computer screen.

Published
2006-02-28
How to Cite
Semyonova, S. E., & Semyonov, E. I. (2006). Photometric control system for the etching rate of thin dielectric films. Technology and Design in Electronic Equipment, (1), 43-45. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2006.1.43
Issue
No. 1 (2006): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2006 Semyonova S. E., Semyonov E. I.

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This work is licensed under a Creative Commons Attribution 4.0 International License.