Microwave plasma-chemical deposition of structures for high-aperture planar optical waveguides

  • V. V. Grigorjantz Institute of Radiotechnics and Electronics, Fryazino, Russia
  • A. P. Dolgov Institute of Radiotechnics and Electronics, Fryazino, Russia
  • L. Yu. Kochmarev Institute of Radiotechnics and Electronics, Fryazino, Russia
  • I. P. Shilov Institute of Radiotechnics and Electronics, Fryazino, Russia
Keywords: planar optical waveguide, microwave discharge, waveguide-type microwave plasmatron

Abstract

The features of forming planar optical waveguides based on quartz glass in a waveguide-type microwave plasmatron operating in the H10 mode have been studied. The proposed microwave discharge excitation device has demonstrated its effectiveness in the development of optical structures of the composition SiO2–F|SiO2|SiO2–F. Based on the obtained optical waveguides, directional couplers with a 16×16 transfer matrix have been created, intended for use in fiber-optic systems for information transmission and processing.

Published
2005-12-30
How to Cite
Grigorjantz, V. V., Dolgov, A. P., Kochmarev, L. Y., & Shilov, I. P. (2005). Microwave plasma-chemical deposition of structures for high-aperture planar optical waveguides. Technology and Design in Electronic Equipment, (6), 39-42. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2005.6.39
Issue
No. 6 (2005): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2005 Grigoryantz V. V., Dolgov A. P., Kochmarev L. Yu., Shilov I. P.

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