Impact-resistant protective film coatings based on AlN in electronic engineering

Abstract

For the formation of AlN protective coatings resistant to impact loads, magnetron and diode sputtering methods, as well as ion beam sputtering, are suitable. Depending on the process conditions, different contents of X-ray amorphous and crystalline phases are obtained in the volume of nanostructured coatings, along with their fibrous structure. Multilayer protective coatings were produced by sequential deposition of amorphous and crystalline AlN layers with an internal fibrous structure on the surfaces of devices.