Image alignment of photomasks in automated optical inspection systems

  • V. N. Krylov Odessa National Polytechnic University, Ukraine
  • G. Yu. Shcherbakova Odessa National Polytechnic University, Ukraine
  • Yu. Yu. Kozina Odessa National Polytechnic University, Ukraine
Keywords: photomask, automated optical inspection systems, fiducial marks, hyperbolic wavelet transform

Abstract

An automated optical positioning system for photomasks of integrated circuits has been developed. The image processing methods are based on hyperbolic wavelet transforms and the calculation of geometric moment features of fiducial marks. The system demonstrates high noise immunity and accuracy.

Published
2007-06-29
How to Cite
Krylov, V. N., Shcherbakova, G. Y., & Kozina, Y. Y. (2007). Image alignment of photomasks in automated optical inspection systems. Technology and Design in Electronic Equipment, (3), 61-64. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.61
Issue
No. 3 (2007): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2007 Krylov V. N., Shcherbakova G. Yu., Kozina Yu. Yu.

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.