RF broad-beam low-energy ion source with electron compensation

  • S. V. Dudin V. N. Karazin Kharkov National University, Ukraine
  • D. V. Rafalskyi V. N. Karazin Kharkov National University, Ukraine
  • A. V. Zykov V. N. Karazin Kharkov National University, Ukraine
Keywords: ion source, HF inductive discharge, ion-optical system, ion beam compensation

Abstract

Characteristics of single-grid RF ion source with 250 mm beam diameter and 1A beam current have been studied. Energy distribution functions of electrons and ions emitted by the source have been measured. It is shown that the emitted electron current is sufficient for full ion beam current compensation. The technique of ion to electron current ratio control allowing to change this ratio in wide range is proposed. Using the ICP in the source allows reaching high current density in the low ion energy range, with the possibility of independent control of ion energy and current density.

Published
2010-04-26
How to Cite
Dudin, S. V., Rafalskyi, D. V., & Zykov, A. V. (2010). RF broad-beam low-energy ion source with electron compensation. Technology and Design in Electronic Equipment, (2), 52-55. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2010.2.52
Issue
No. 2 (2010): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2010 Dudin S. V., Rafalskyi D. V., Zykov A. V.

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This work is licensed under a Creative Commons Attribution 4.0 International License.