Comparative analysis of silicon readout circuit technologies for IR photodiodes
Abstract
A comparative analysis of the advantages and disadvantages of two technologies for fabricating readout circuits for infrared photodiodes has been carried out: complementary MOS (CMOS) technology and charge-coupled device (CCD) technology based on n-channel MOS structures. Parameters of experimental samples of integrated readout circuits (IRC) with a 2×64 format, manufactured using these technologies, are presented. The results demonstrate the feasibility of producing IRCs capable of operating at cryogenic temperatures.
Copyright (c) 2007 Reva V. Р., Korinetz S. V., Pysarenko L. A., Dukhnin S. E., Barsukova N. A.

This work is licensed under a Creative Commons Attribution 4.0 International License.