Optical proximity correction in IC design

  • I. A. Rodionov Bauman Moscow State Technical University, Russia
  • V. V. Makarchuk Bauman Moscow State Technical University, Russia
Keywords: lithography, optical proximity correction, design, simulation

Abstract

Methods and types of figures for optical proximity correction are considered. The lithography process was simulated using the discussed correction figures, and the modeling results were experimentally verified

Published
2007-06-29
How to Cite
Rodionov, I. A., & Makarchuk, V. V. (2007). Optical proximity correction in IC design. Technology and Design in Electronic Equipment, (3), 30-32. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2007.3.30
Issue
No. 3 (2007): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2007 Rodionov I. A., Makarchuk V. V.

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.