Deposition of thin films in vacuum on synthetic opal substrates

  • Yu. V. Panfilov Bauman Moscow State Technical University, Russia
  • M. I. Samoylovich Central Research Technological Institute “Technomash”, Moscow, Russia
  • E. V. Bulygina Central Research Technological Institute “Technomash”, Moscow, Russia
Keywords: thin films, photonic crystal, opal matrix, thermal evaporation, ion-plasma sputtering, ion-beam deposition

Abstract

The influence of thermal evaporation, ion-plasma magnetron sputtering, and ion-beam deposition methods of thin films on the surface characteristics of photonic crystals is examined. Schemes of thin film formation processes on opal matrices and designs of technological equipment are presented. The results of electrical resistance measurements of the films and surface topography characteristics of photonic crystal samples obtained using an atomic force microscope are provided.

Published
2005-04-29
How to Cite
Panfilov, Y. V., Samoylovich, M. I., & Bulygina, E. V. (2005). Deposition of thin films in vacuum on synthetic opal substrates. Technology and Design in Electronic Equipment, (2), 49-52. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2005.2.49
Issue
No. 2 (2005): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2005 Panfilov Yu. V., Samoylovich M. I., Bulygina E. V.

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