Formation of columnar leads for GaAs pixel detectors
Abstract
In the fabrication of hybrid ionizing radiation pixel detectors, the sensor array is connected to the readout device using columnar interconnects via flip-chip technology. A process for forming Pb/Sn and In columnar interconnects on GaAs sensor arrays has been developed and investigated. A TiW/Ag system deposited by magnetron sputtering is proposed as the under-column metallization. The process conditions, sequence of operations, and parameters of the resulting columns are presented.
Copyright (c) 2004 Z. V. Berishvili, L. V. Jangidze, G. A. Skhiladze, R. G. Melkadze, T. M. Lezhneva, G. G. Peradze

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