Application of controlled anodic oxidation for rapid monitoring in thin-film technology and thin-film structures

  • T. S. Lebedeva V. M. Glushkov Institute of Cybernetics of the NAS of Ukraine
  • P. B. Shpilevoy V. M. Glushkov Institute of Cybernetics of the NAS of Ukraine
  • I. D. Voitovich V. M. Glushkov Institute of Cybernetics of the NAS of Ukraine
Keywords: controlled anodic oxidation, anodizing profiles, thin-film structures, rapid monitoring, Josephson device technology, nanostructured oxide films

Abstract

The fundamentals of the controlled anodic oxidation method ("anodic spectroscopy"), its application techniques, and the results of studies of multilayer thin-film structures are presented. Anodizing profiles of structures formed by electron-beam and magnetron deposition of Nb and Al films, with barrier AlOx oxide formed by thermal oxidation and magnetron glow discharge, were obtained and analyzed. The method’s application for monitoring the formation of nanostructured anodic aluminum oxide films is demonstrated. The effectiveness of the method for rapid monitoring in thin-film technologies is shown.

Published
2003-10-31
How to Cite
Lebedeva, T. S., Shpilevoy, P. B., & Voitovich, I. D. (2003). Application of controlled anodic oxidation for rapid monitoring in thin-film technology and thin-film structures. Technology and Design in Electronic Equipment, (5), 42-46. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.5.42
Issue
No. 5 (2003): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2003 Lebedeva T. S., Shpilevoy P. B., Voitovich I. D.

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