Numerical modeling of laser photoionization technologies for atomic‑level material purification

Abstract

For the first time, a methodology for numerical modeling of optimal schemes of laser photoionization technologies for material control and purification at the atomic level has been proposed and implemented (illustrated by the analysis of Al impurities in a Ge sample). The laser photoionization separation scheme includes, at the first stage, excitation of impurity atoms in the sample by resonant laser radiation; at the second stage, transfer of atoms into highly excited Rydberg states, followed by ionization with an electric field. The developed approach makes it possible to select both optimized values of key physical parameters of separation schemes and the most efficient scheme variant as a whole.