Study of thin-film resistor resistance error

  • V. G. Spirin Arzamas Polytechnic Institute (branch) of the NSTU, Russia
Keywords: thin-film resistor, contact area of overlap

Abstract

A relationship between a thin-film resistor resistance error and mask misalignment with a substrate conductive layer at the second photolithography stage for a thin-film resistor design in which the resistive element does not overlap conductor pads is studied. The error value is at a maximum when the resistor aspect ratio is equal to 1.0.

Published
2009-10-30
How to Cite
Spirin, V. G. (2009). Study of thin-film resistor resistance error. Technology and Design in Electronic Equipment, (5), 42-44. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.5.42
Issue
No. 5 (2009): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2009 Spirin V. G.

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.