Nalivaiko OY, Turtsevich AS. The adsorptive-kinetic model of in-situ phosphorus doped film polysilicon deposition process. TKEA [Internet]. 2009Dec.28 [cited 2025Dec.2];(6):50-5. Available from: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.50