Rubtsevich II, Solovyov YA, Vysotskiy VB, Dudkin AI, Kovalchuk NS. Investigation of properties of nitride and silicon oxide films grown by plasma-chemical deposition on a silicon substrate. TKEA [Internet]. 2011Aug.24 [cited 2025Nov.4];(4):29-2. Available from: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2011.4.29