Kazakov AI, Andriyanov AV, Mironov VS, Polyarush OV. Calculation of frequency dependence of dielectric characteristics of thin films in the HfO₂—Nd₂O₃ system. TKEA [Internet]. 2003Feb.28 [cited 2026Jul.3];(1):52-4. Available from: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2003.1.52