Nalivaiko, O. Y., and A. S. Turtsevich. “The Adsorptive-Kinetic Model of in-Situ Phosphorus Doped Film Polysilicon Deposition Process”. Technology and Design in Electronic Equipment, no. 6, Dec. 2009, pp. 50-55, https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.50.