Nalivaiko, O. Y. and Turtsevich, A. S. (2009) “The adsorptive-kinetic model of in-situ phosphorus doped film polysilicon deposition process”, Technology and design in electronic equipment, (6), pp. 50-55. Available at: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.50 (Accessed: 2December2025).