Rubtsevich, I. I., Solovyov, Y. A., Vysotskiy, V. B., Dudkin, A. I. and Kovalchuk, N. S. (2011) “Investigation of properties of nitride and silicon oxide films grown by plasma-chemical deposition on a silicon substrate”, Technology and design in electronic equipment, (4), pp. 29-32. Available at: https://www.tkea.com.ua/index.php/journal/article/view/TKEA2011.4.29 (Accessed: 4November2025).