Nalivaiko, O. Yu., and A. S. Turtsevich. 2009. “The Adsorptive-Kinetic Model of in-Situ Phosphorus Doped Film Polysilicon Deposition Process”. Technology and Design in Electronic Equipment, no. 6 (December), 50-55. https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.6.50.