Boltovets, M. S., Borisenko, A. G., Ivanov, V. N., FedorovichО. А., Krivutsa, V. A., & Polozov, B. P. (2009). Forming of 4НSiC p–i–n-diodes mesastructures by the ion-plasmous etching method. Technology and Design in Electronic Equipment, (5), 45-48. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2009.5.45