Dudin, S. V., LisovskiyV. А., Dahov, A. N., & Pletniov, V. M. (2011). RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors. Technology and Design in Electronic Equipment, (1–2), 42-48. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2011.1-2.42