The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering

  • V. V. Brus I. M. Frantsevich Institute for problems of materials science of NAS of Ukraine, Chernivtsi department, Ukraine
  • Z. D. Kovaluk I. M. Frantsevich Institute for problems of materials science of NAS of Ukraine, Chernivtsi department, Ukraine
  • P. D. Maryanchuk Yurii Fedkovych Chernivtsi National University, Chernivtsy, Ukraine
  • I. G. Orletsky Yurii Fedkovych Chernivtsi National University, Chernivtsy, Ukraine
  • E. V. Maystruk Yurii Fedkovych Chernivtsi National University, Chernivtsy, Ukraine
Keywords: titanium dioxide, film, magnetron sputtering

Abstract

The article deals with research on volt-ampere characteristics of metal contacts (Al, Cr, In, Mo, Ti) on titanium dioxide thin films and influence of annealing in vacuum on their electric properties. Volt-ampere characteristics measurements were taken by three-probe method. There was established that indium contact on TiO2 thin films possessed sharply defined ohmic properties.

Published
2010-12-26
How to Cite
Brus, V. V., Kovaluk, Z. D., Maryanchuk, P. D., Orletsky, I. G., & Maystruk, E. V. (2010). The properties of metal contacts on TiO2 thin films produced by reactive magnetron sputtering. Technology and Design in Electronic Equipment, (5–6), 60-62. Retrieved from https://www.tkea.com.ua/index.php/journal/article/view/TKEA2010.5-6.60
Issue
No. 5–6 (2010): Tekhnologiya i konstruirovanie v elektronnoi apparature
Section
Articles

Copyright (c) 2010 Brus V. V., Kovaluk Z. D., Maryanchuk P. D., Orletsky I. G., Maystruk E. V.

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