Nalivaiko, O. Yu., and A. S. Turtsevich. “The Deposition of Silicon Nitride Films under Low Pressure on Wafers up to 200 Mm”. Technology and design in electronic equipment, no. 6 (December 27, 2012): 34-39. Accessed September 16, 2025. http://www.tkea.com.ua/index.php/journal/article/view/TKEA2012.6.34.