The source of macroparticle-free plasma flows for nanoelectronics

Abstract

The paper describes the source of solid-phase materials plasma flow generated by vacuum-arc discharge in vapours of diffuse evaporated anode. The source can efficiently create macroparticle-free plasma flows of various metals in vacuum, and provided the vacuum chamber is filled with required working gases, the source creates gas and gas-metal plasma flows. The main characteristics of the discharge and the parameters of the plasma flows with compensated volume charge are presented. The source can be used for application of island and thin metal films on substrates of different materials, including dielectrics.